Helium Ion Microscopy: Principles and Applications
Gespeichert in:
| Beteilige Person: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | Englisch |
| Veröffentlicht: |
New York, NY [u.a.]
Springer
2013
|
| Schriftenreihe: | SpringerBriefs in Materials
|
| Links: | https://doi.org/10.1007/978-1-4614-8660-2 https://doi.org/10.1007/978-1-4614-8660-2 http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=026826539&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=026826539&sequence=000003&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA |
| Umfang: | 1 Online-Ressource |
| ISBN: | 9781461486602 |
| DOI: | 10.1007/978-1-4614-8660-2 |
Internformat
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Datensatz im Suchindex
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| adam_text | HELIUM ION MICROSCOPY
/ JOY, DAVID C.
: 2013
TABLE OF CONTENTS / INHALTSVERZEICHNIS
CHAPTER 1: INTRODUCTION TO HELIUM ION MICROSCOPY
CHAPTER 2: MICROSCOPY WITH IONS - A BRIEF HISTORY
CHAPTER 3: OPERATING THE HELIUM ION MICROSCOPE
CHAPTER 4: ION –SOLID INTERACTIONS AND IMAGE FORMATION
CHAPTER 5: CHARGING AND DAMAGE
CHAPTER 6: MICROANALYSIS WITH THE HIM
CHAPTER 7: ION GENERATED DAMAGE
CHAPTER 8: WORKING WITH OTHER ION BEAMS
CHAPTER 9: PATTERNING AND NANOFABRICATION
CONCLUSION
BIBLIOGRAPHY
APPENDIX: ISE YIELDS, AND IONISE PARAMETERS FOR HE+ EXCITATION
OF ELEMENTS AND COMPOUNDS
INDEX
DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT.
HELIUM ION MICROSCOPY
/ JOY, DAVID C.
: 2013
ABSTRACT / INHALTSTEXT
HELIUM ION MICROSCOPY: PRINCIPLES AND APPLICATIONS DESCRIBES THE THEORY
AND DISCUSSES THE PRACTICAL DETAILS OF WHY SCANNING MICROSCOPES USING
BEAMS OF LIGHT IONS – SUCH AS THE HELIUM ION MICROSCOPE (HIM) – ARE
DESTINED TO BECOME THE IMAGING TOOLS OF CHOICE FOR THE 21ST CENTURY.
TOPICS COVERED INCLUDE THE PRINCIPLES, OPERATION, AND PERFORMANCE OF THE
GASEOUS FIELD ION SOURCE (GFIS), AND A COMPARISON OF THE OPTICS OF ION
AND ELECTRON BEAM MICROSCOPES INCLUDING THEIR OPERATING CONDITIONS,
RESOLUTION, AND SIGNAL-TO-NOISE PERFORMANCE. THE PHYSICAL PRINCIPLES OF
ION-INDUCED SECONDARY ELECTRON (ISE) GENERATION BY IONS ARE DISCUSSED,
AND AN EXTENSIVE DATABASE OF ISE YIELDS FOR MANY ELEMENTS AND COMPOUNDS
AS A FUNCTION OF INCIDENT ION SPECIES AND ITS ENERGY IS INCLUDED. BEAM
DAMAGE AND CHARGING ARE FREQUENTLY OUTCOMES OF ION BEAM IRRADIATION, AND
TECHNIQUES TO MINIMIZE SUCH PROBLEMS ARE PRESENTED. IN ADDITION TO
IMAGING, IONS BEAMS CAN BE USED FOR THE CONTROLLED DEPOSITION, OR
REMOVAL, OF SELECTED MATERIALS WITH NANOMETER PRECISION. THE TECHNIQUES
AND CONDITIONS REQUIRED FOR NANOFABRICATION ARE DISCUSSED AND
DEMONSTRATED. FINALLY, THE PROBLEM OF PERFORMING CHEMICAL MICROANALYSIS
WITH ION BEAMS IS CONSIDERED. LOW ENERGY IONS CANNOT GENERATE X-RAY
EMISSIONS, SO ALTERNATIVE TECHNIQUES SUCH AS RUTHERFORD BACKSCATTER
IMAGING (RBI) OR SECONDARY ION MASS SPECTROMETRY (SIMS) ARE EXAMINED.
SERVES AS A CONCISE BUT AUTHORITATIVE INTRODUCTION TO THE LATEST
INNOVATION IN SCANNING MICROSCOPY COMPARES ION AND ELECTRON BEAMS AS
OPTIONS FOR MICROSCOPY PRESENTS A DETAILED PHYSICAL MODEL OF ION-SOLID
INTERACTIONS AND SIGNAL GENERATION PROVIDES A DETAILED DATABASE OF ISE
YIELD BEHAVIOR AS A FUNCTION OF THE TARGET ION, ELEMENT, AND ENERGY
DIESES SCHRIFTSTUECK WURDE MASCHINELL ERZEUGT.
|
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| isbn | 9781461486602 |
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| spellingShingle | Joy, David C. 1943- Helium Ion Microscopy Principles and Applications |
| title | Helium Ion Microscopy Principles and Applications |
| title_auth | Helium Ion Microscopy Principles and Applications |
| title_exact_search | Helium Ion Microscopy Principles and Applications |
| title_full | Helium Ion Microscopy Principles and Applications David C. Joy |
| title_fullStr | Helium Ion Microscopy Principles and Applications David C. Joy |
| title_full_unstemmed | Helium Ion Microscopy Principles and Applications David C. Joy |
| title_short | Helium Ion Microscopy |
| title_sort | helium ion microscopy principles and applications |
| title_sub | Principles and Applications |
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