Patterning the world: the rise of chemically amplified photoresists
Gespeichert in:
Beteilige Person: | |
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Format: | Paper |
Sprache: | Englisch |
Veröffentlicht: |
2007
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Schlagwörter: | |
Umfang: | Ill. |
ISSN: | 0736-4555 |
Internformat
MARC
LEADER | 00000naa a2200000 c 4500 | ||
---|---|---|---|
001 | BV022882517 | ||
003 | DE-604 | ||
005 | 20111229 | ||
007 | t| | ||
008 | 071015s2007 xx a||| |||| 00||| eng d | ||
035 | |a (OCoLC)907858340 | ||
035 | |a (DE-599)BVBBV022882517 | ||
040 | |a DE-604 |b ger |e rakwb | ||
041 | 0 | |a eng | |
049 | |a DE-210 | ||
100 | 1 | |a Brock, David C. |e Verfasser |4 aut | |
245 | 1 | 0 | |a Patterning the world |b the rise of chemically amplified photoresists |c by David C. Brock |
264 | 1 | |c 2007 | |
300 | |b Ill. | ||
336 | |b txt |2 rdacontent | ||
337 | |b n |2 rdamedia | ||
338 | |b nc |2 rdacarrier | ||
648 | 7 | |a Geschichte |2 gnd |9 rswk-swf | |
650 | 0 | 7 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |2 gnd |9 rswk-swf |
650 | 0 | 7 | |a Chemie |0 (DE-588)4009816-3 |2 gnd |9 rswk-swf |
689 | 0 | 0 | |a Halbleitertechnologie |0 (DE-588)4158814-9 |D s |
689 | 0 | 1 | |a Chemie |0 (DE-588)4009816-3 |D s |
689 | 0 | 2 | |a Geschichte |A z |
689 | 0 | |5 DE-604 | |
773 | 0 | 8 | |t Chemical heritage / Chemical Heritage Foundation |d Philadelphia, Pa. |g 25. 2007/08 (2007),3, S. 26 - 31 |w (DE-604)BV013333523 |x 0736-4555 |o (DE-600)1227136-6 |
943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-016087475 |
Datensatz im Suchindex
_version_ | 1818964704842743808 |
---|---|
any_adam_object | |
article_link | (DE-604)BV013333523 |
author | Brock, David C. |
author_facet | Brock, David C. |
author_role | aut |
author_sort | Brock, David C. |
author_variant | d c b dc dcb |
building | Verbundindex |
bvnumber | BV022882517 |
ctrlnum | (OCoLC)907858340 (DE-599)BVBBV022882517 |
era | Geschichte gnd |
era_facet | Geschichte |
format | Article |
fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01151naa a2200337 c 4500</leader><controlfield tag="001">BV022882517</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20111229 </controlfield><controlfield tag="007">t|</controlfield><controlfield tag="008">071015s2007 xx a||| |||| 00||| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)907858340</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV022882517</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-210</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Brock, David C.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Patterning the world</subfield><subfield code="b">the rise of chemically amplified photoresists</subfield><subfield code="c">by David C. Brock</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="c">2007</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="b">Ill.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="648" ind1=" " ind2="7"><subfield code="a">Geschichte</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4158814-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Chemie</subfield><subfield code="0">(DE-588)4009816-3</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Halbleitertechnologie</subfield><subfield code="0">(DE-588)4158814-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Chemie</subfield><subfield code="0">(DE-588)4009816-3</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Geschichte</subfield><subfield code="A">z</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="773" ind1="0" ind2="8"><subfield code="t">Chemical heritage / Chemical Heritage Foundation</subfield><subfield code="d">Philadelphia, Pa.</subfield><subfield code="g">25. 2007/08 (2007),3, S. 26 - 31</subfield><subfield code="w">(DE-604)BV013333523</subfield><subfield code="x">0736-4555</subfield><subfield code="o">(DE-600)1227136-6</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-016087475</subfield></datafield></record></collection> |
id | DE-604.BV022882517 |
illustrated | Illustrated |
indexdate | 2024-12-20T13:05:21Z |
institution | BVB |
issn | 0736-4555 |
language | English |
oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-016087475 |
oclc_num | 907858340 |
open_access_boolean | |
owner | DE-210 |
owner_facet | DE-210 |
physical | Ill. |
publishDate | 2007 |
publishDateSearch | 2007 |
publishDateSort | 2007 |
record_format | marc |
spelling | Brock, David C. Verfasser aut Patterning the world the rise of chemically amplified photoresists by David C. Brock 2007 Ill. txt rdacontent n rdamedia nc rdacarrier Geschichte gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 gnd rswk-swf Chemie (DE-588)4009816-3 gnd rswk-swf Halbleitertechnologie (DE-588)4158814-9 s Chemie (DE-588)4009816-3 s Geschichte z DE-604 Chemical heritage / Chemical Heritage Foundation Philadelphia, Pa. 25. 2007/08 (2007),3, S. 26 - 31 (DE-604)BV013333523 0736-4555 (DE-600)1227136-6 |
spellingShingle | Brock, David C. Patterning the world the rise of chemically amplified photoresists Halbleitertechnologie (DE-588)4158814-9 gnd Chemie (DE-588)4009816-3 gnd |
subject_GND | (DE-588)4158814-9 (DE-588)4009816-3 |
title | Patterning the world the rise of chemically amplified photoresists |
title_auth | Patterning the world the rise of chemically amplified photoresists |
title_exact_search | Patterning the world the rise of chemically amplified photoresists |
title_full | Patterning the world the rise of chemically amplified photoresists by David C. Brock |
title_fullStr | Patterning the world the rise of chemically amplified photoresists by David C. Brock |
title_full_unstemmed | Patterning the world the rise of chemically amplified photoresists by David C. Brock |
title_short | Patterning the world |
title_sort | patterning the world the rise of chemically amplified photoresists |
title_sub | the rise of chemically amplified photoresists |
topic | Halbleitertechnologie (DE-588)4158814-9 gnd Chemie (DE-588)4009816-3 gnd |
topic_facet | Halbleitertechnologie Chemie |
work_keys_str_mv | AT brockdavidc patterningtheworldtheriseofchemicallyamplifiedphotoresists |