Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD:
Gespeichert in:
| Beteilige Person: | |
|---|---|
| Format: | Buch |
| Sprache: | Deutsch |
| Veröffentlicht: |
Aachen
Shaker
1999
|
| Ausgabe: | Als Ms. gedr. |
| Schriftenreihe: | Berichte aus der Halbleitertechnik
|
| Schlagwörter: | |
| Links: | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=008571026&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| Beschreibung: | Zugl.: Aachen, Techn. Hochsch., Diss., 1999 |
| Umfang: | 125 S. Ill., graph. Darst. 21 cm |
| ISBN: | 3826562186 |
Internformat
MARC
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| 003 | DE-604 | ||
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| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a ger | |
| 044 | |a gw |c DE | ||
| 049 | |a DE-91 |a DE-29T | ||
| 084 | |a ELT 279d |2 stub | ||
| 100 | 1 | |a Stein, Josef |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD |c Josef Stein |
| 250 | |a Als Ms. gedr. | ||
| 264 | 1 | |a Aachen |b Shaker |c 1999 | |
| 300 | |a 125 S. |b Ill., graph. Darst. |c 21 cm | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 0 | |a Berichte aus der Halbleitertechnik | |
| 500 | |a Zugl.: Aachen, Techn. Hochsch., Diss., 1999 | ||
| 650 | 0 | 7 | |a Siliciumdioxid |0 (DE-588)4077447-8 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a PECVD-Verfahren |0 (DE-588)4267316-1 |D s |
| 689 | 0 | 1 | |a Siliciumdioxid |0 (DE-588)4077447-8 |D s |
| 689 | 0 | |5 DE-604 | |
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| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-008571026 | |
Datensatz im Suchindex
| DE-BY-TUM_call_number | 0001 2000 A 1092 |
|---|---|
| DE-BY-TUM_katkey | 1136914 |
| DE-BY-TUM_location | Mag |
| DE-BY-TUM_media_number | 040004820246 |
| _version_ | 1821931725539770369 |
| any_adam_object | 1 |
| author | Stein, Josef |
| author_facet | Stein, Josef |
| author_role | aut |
| author_sort | Stein, Josef |
| author_variant | j s js |
| building | Verbundindex |
| bvnumber | BV012618151 |
| classification_tum | ELT 279d |
| ctrlnum | (OCoLC)76063420 (DE-599)BVBBV012618151 |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| edition | Als Ms. gedr. |
| format | Book |
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| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV012618151 |
| illustrated | Illustrated |
| indexdate | 2024-12-20T10:33:23Z |
| institution | BVB |
| isbn | 3826562186 |
| language | German |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008571026 |
| oclc_num | 76063420 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM DE-29T |
| owner_facet | DE-91 DE-BY-TUM DE-29T |
| physical | 125 S. Ill., graph. Darst. 21 cm |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | Shaker |
| record_format | marc |
| series2 | Berichte aus der Halbleitertechnik |
| spellingShingle | Stein, Josef Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD Siliciumdioxid (DE-588)4077447-8 gnd PECVD-Verfahren (DE-588)4267316-1 gnd |
| subject_GND | (DE-588)4077447-8 (DE-588)4267316-1 (DE-588)4113937-9 |
| title | Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD |
| title_auth | Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD |
| title_exact_search | Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD |
| title_full | Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD Josef Stein |
| title_fullStr | Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD Josef Stein |
| title_full_unstemmed | Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD Josef Stein |
| title_short | Niedertemperatur-Deposition von Siliziumdioxid mittels Remote-PECVD |
| title_sort | niedertemperatur deposition von siliziumdioxid mittels remote pecvd |
| topic | Siliciumdioxid (DE-588)4077447-8 gnd PECVD-Verfahren (DE-588)4267316-1 gnd |
| topic_facet | Siliciumdioxid PECVD-Verfahren Hochschulschrift |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=008571026&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT steinjosef niedertemperaturdepositionvonsiliziumdioxidmittelsremotepecvd |
Inhaltsverzeichnis
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Bibliotheksmagazin
| Signatur: |
0001 2000 A 1092 Lageplan |
|---|---|
| Exemplar 1 | Ausleihbar Am Standort |