Plasma etching for integrated silicon sensor applictions:
Gespeichert in:
| Beteilige Person: | |
|---|---|
| Format: | Buch |
| Sprache: | Englisch |
| Veröffentlicht: |
Delft
Univ. Press
1995
|
| Schlagwörter: | |
| Beschreibung: | Zugl.: Delft, Techn. Univ., Diss., 1995 |
| Umfang: | XI, 221 S. Ill., graph. Darst. |
| ISBN: | 9040711771 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV010706131 | ||
| 003 | DE-604 | ||
| 005 | 19960923 | ||
| 007 | t| | ||
| 008 | 960412s1995 xx ad|| m||| 00||| engod | ||
| 020 | |a 9040711771 |9 90-407-1177-1 | ||
| 035 | |a (OCoLC)34556198 | ||
| 035 | |a (DE-599)BVBBV010706131 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-91 | ||
| 050 | 0 | |a TK7874 | |
| 084 | |a ELT 285d |2 stub | ||
| 100 | 1 | |a Li, Yuan Xiong |e Verfasser |4 aut | |
| 245 | 1 | 0 | |a Plasma etching for integrated silicon sensor applictions |c door Yuan Xiong Li |
| 264 | 1 | |a Delft |b Univ. Press |c 1995 | |
| 300 | |a XI, 221 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Zugl.: Delft, Techn. Univ., Diss., 1995 | ||
| 650 | 4 | |a Detectors | |
| 650 | 4 | |a Plasma etching | |
| 650 | 0 | 7 | |a Silicium |0 (DE-588)4077445-4 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Plasmaätzen |0 (DE-588)4174821-9 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Integrierter Sensor |0 (DE-588)4235815-2 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)4113937-9 |a Hochschulschrift |2 gnd-content | |
| 689 | 0 | 0 | |a Integrierter Sensor |0 (DE-588)4235815-2 |D s |
| 689 | 0 | 1 | |a Silicium |0 (DE-588)4077445-4 |D s |
| 689 | 0 | 2 | |a Plasmaätzen |0 (DE-588)4174821-9 |D s |
| 689 | 0 | |5 DE-604 | |
| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-007147053 | |
Datensatz im Suchindex
| DE-BY-TUM_call_number | 0001 95 A 3987 |
|---|---|
| DE-BY-TUM_katkey | 735812 |
| DE-BY-TUM_location | Mag |
| DE-BY-TUM_media_number | 040001759711 |
| _version_ | 1821931079092666370 |
| any_adam_object | |
| author | Li, Yuan Xiong |
| author_facet | Li, Yuan Xiong |
| author_role | aut |
| author_sort | Li, Yuan Xiong |
| author_variant | y x l yx yxl |
| building | Verbundindex |
| bvnumber | BV010706131 |
| callnumber-first | T - Technology |
| callnumber-label | TK7874 |
| callnumber-raw | TK7874 |
| callnumber-search | TK7874 |
| callnumber-sort | TK 47874 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_tum | ELT 285d |
| ctrlnum | (OCoLC)34556198 (DE-599)BVBBV010706131 |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01333nam a2200409 c 4500</leader><controlfield tag="001">BV010706131</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">19960923 </controlfield><controlfield tag="007">t|</controlfield><controlfield tag="008">960412s1995 xx ad|| m||| 00||| engod</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9040711771</subfield><subfield code="9">90-407-1177-1</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)34556198</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV010706131</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 285d</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Li, Yuan Xiong</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Plasma etching for integrated silicon sensor applictions</subfield><subfield code="c">door Yuan Xiong Li</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Delft</subfield><subfield code="b">Univ. Press</subfield><subfield code="c">1995</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XI, 221 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Zugl.: Delft, Techn. Univ., Diss., 1995</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Detectors</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Plasma etching</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Integrierter Sensor</subfield><subfield code="0">(DE-588)4235815-2</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)4113937-9</subfield><subfield code="a">Hochschulschrift</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Integrierter Sensor</subfield><subfield code="0">(DE-588)4235815-2</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="2"><subfield code="a">Plasmaätzen</subfield><subfield code="0">(DE-588)4174821-9</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-007147053</subfield></datafield></record></collection> |
| genre | (DE-588)4113937-9 Hochschulschrift gnd-content |
| genre_facet | Hochschulschrift |
| id | DE-604.BV010706131 |
| illustrated | Illustrated |
| indexdate | 2024-12-20T09:59:14Z |
| institution | BVB |
| isbn | 9040711771 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-007147053 |
| oclc_num | 34556198 |
| open_access_boolean | |
| owner | DE-91 DE-BY-TUM |
| owner_facet | DE-91 DE-BY-TUM |
| physical | XI, 221 S. Ill., graph. Darst. |
| publishDate | 1995 |
| publishDateSearch | 1995 |
| publishDateSort | 1995 |
| publisher | Univ. Press |
| record_format | marc |
| spellingShingle | Li, Yuan Xiong Plasma etching for integrated silicon sensor applictions Detectors Plasma etching Silicium (DE-588)4077445-4 gnd Plasmaätzen (DE-588)4174821-9 gnd Integrierter Sensor (DE-588)4235815-2 gnd |
| subject_GND | (DE-588)4077445-4 (DE-588)4174821-9 (DE-588)4235815-2 (DE-588)4113937-9 |
| title | Plasma etching for integrated silicon sensor applictions |
| title_auth | Plasma etching for integrated silicon sensor applictions |
| title_exact_search | Plasma etching for integrated silicon sensor applictions |
| title_full | Plasma etching for integrated silicon sensor applictions door Yuan Xiong Li |
| title_fullStr | Plasma etching for integrated silicon sensor applictions door Yuan Xiong Li |
| title_full_unstemmed | Plasma etching for integrated silicon sensor applictions door Yuan Xiong Li |
| title_short | Plasma etching for integrated silicon sensor applictions |
| title_sort | plasma etching for integrated silicon sensor applictions |
| topic | Detectors Plasma etching Silicium (DE-588)4077445-4 gnd Plasmaätzen (DE-588)4174821-9 gnd Integrierter Sensor (DE-588)4235815-2 gnd |
| topic_facet | Detectors Plasma etching Silicium Plasmaätzen Integrierter Sensor Hochschulschrift |
| work_keys_str_mv | AT liyuanxiong plasmaetchingforintegratedsiliconsensorapplictions |
Paper/Kapitel scannen lassen
Bibliotheksmagazin
| Signatur: |
0001 95 A 3987 Lageplan |
|---|---|
| Exemplar 1 | Ausleihbar Am Standort |