Thin film deposition: principles and practice
Gespeichert in:
| Beteilige Person: | |
|---|---|
| Format: | Buch |
| Sprache: | Englisch |
| Veröffentlicht: |
New York u.a.
McGraw-Hill
1995
|
| Ausgabe: | Internat. ed. |
| Schlagwörter: | |
| Links: | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006790180&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| Beschreibung: | Hier auch spätere, unveränderte Nachdrucke |
| Umfang: | XXIII, 616 S. Ill., graph. Darst. |
| ISBN: | 0070585024 9780070585027 0071139133 |
Internformat
MARC
| LEADER | 00000nam a2200000 c 4500 | ||
|---|---|---|---|
| 001 | BV010217474 | ||
| 003 | DE-604 | ||
| 005 | 20161024 | ||
| 007 | t| | ||
| 008 | 950612s1995 xx ad|| |||| 00||| eng d | ||
| 020 | |a 0070585024 |9 0-07-058502-4 | ||
| 020 | |a 9780070585027 |9 978-0-07-058502-7 | ||
| 020 | |a 0071139133 |9 0-07-113913-3 | ||
| 035 | |a (OCoLC)318378737 | ||
| 035 | |a (DE-599)BVBBV010217474 | ||
| 040 | |a DE-604 |b ger |e rakddb | ||
| 041 | 0 | |a eng | |
| 049 | |a DE-898 |a DE-355 |a DE-91 |a DE-29T |a DE-703 |a DE-19 |a DE-634 |a DE-20 |a DE-83 |a DE-706 |a DE-11 |a DE-384 | ||
| 082 | 0 | |a 621.38152 |b S537 |2 20 | |
| 084 | |a UP 7550 |0 (DE-625)146434: |2 rvk | ||
| 084 | |a ELT 279f |2 stub | ||
| 100 | 1 | |a Smith, Donald L. |d 1953- |e Verfasser |0 (DE-588)120228041 |4 aut | |
| 245 | 1 | 0 | |a Thin film deposition |b principles and practice |c Donald L. Smith |
| 246 | 1 | 3 | |a Thin-film deposition |
| 250 | |a Internat. ed. | ||
| 264 | 1 | |a New York u.a. |b McGraw-Hill |c 1995 | |
| 300 | |a XXIII, 616 S. |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 500 | |a Hier auch spätere, unveränderte Nachdrucke | ||
| 650 | 4 | |a Dispositivos de películas delgadas | |
| 650 | 4 | |a Galvanoplastia al vapor | |
| 650 | 4 | |a Películas delgadas | |
| 650 | 0 | 7 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Dünne Schicht |0 (DE-588)4136925-7 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Gasphasenepitaxie |0 (DE-588)4156040-1 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Bauelement |0 (DE-588)4004741-6 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a CVD-Verfahren |0 (DE-588)4009846-1 |2 gnd |9 rswk-swf |
| 689 | 0 | 0 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 0 | 1 | |a Gasphasenepitaxie |0 (DE-588)4156040-1 |D s |
| 689 | 0 | |5 DE-604 | |
| 689 | 1 | 0 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 1 | 1 | |a Bauelement |0 (DE-588)4004741-6 |D s |
| 689 | 1 | |5 DE-604 | |
| 689 | 2 | 0 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |D s |
| 689 | 2 | |5 DE-604 | |
| 689 | 3 | 0 | |a Dünnschichttechnik |0 (DE-588)4136339-5 |D s |
| 689 | 3 | 1 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
| 689 | 3 | |5 DE-604 | |
| 689 | 4 | 0 | |a CVD-Verfahren |0 (DE-588)4009846-1 |D s |
| 689 | 4 | 1 | |a Dünne Schicht |0 (DE-588)4136925-7 |D s |
| 689 | 4 | |5 DE-604 | |
| 856 | 4 | 2 | |m GBV Datenaustausch |q application/pdf |u http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006790180&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |3 Inhaltsverzeichnis |
| 943 | 1 | |a oai:aleph.bib-bvb.de:BVB01-006790180 | |
Datensatz im Suchindex
| DE-BY-TUM_call_number | 0202 ELT 279 95 A 1390 |
|---|---|
| DE-BY-TUM_katkey | 655136 |
| DE-BY-TUM_location | 02 |
| DE-BY-TUM_media_number | 040006610519 |
| _version_ | 1821931227583610880 |
| adam_text | THIN-FILM DEPOSITION PRINCIPLES AND PRACTICE DONALD L. SMITH BOSTON,
MASSACHUSETTS BURR RIDGE, ILLINOIS DUBUQUE, IOWA MADISON, WISCONSIN NEW
YORK, NEW YORK SAN FRANCISCO, CALIFORNIA ST. LOUIS, MISSOURI CONTENTS
PREFACE XI ACKNOWLEDGMENTS XIII SYMBOLS AND ABBREVIATIONS XV CHAPTER 1.
THIN-FILM TECHNOLOGY 1 1.1 APPLICATIONS 1 1.2 PROCESS STEPS 3 1.3
CONCLUSION 7 1.4 EXERCISE 7 CHAPTER 2. GAS KINETICS 9 12 15 17 20 21 23
25 27 28 29 32 33 33 2.12 RECOMMENDED READINGS 34 CHAPTER 3. VACUUM
TECHNOLOGY 35 3.1 PUMP SELECTION AND EXHAUST HANDLING 36 3.2 PROBLEM
GASES 40 3.3 GAS THROUGHPUT 41 2.1 2.2 2.3 2.4 2.5 2.6 2.7 2.8 2.9 2.10
2.11 VAPORS AND GASES MAXWELL-BOLTZMANN DISTRIBUTION MOLECULAR
IMPINGEMENT FLUX IDEAL-GAS LAW UNITS OF MEASUREMENT KNUDSEN EQUATION
MEAN FREE PATH TRANSPORT PROPERTIES 2.8.1 DIFFUSION 2.8.2 VISCOSITY
2.8.3 HEAT CONDUCTION CONCLUSION EXERCISES REFERENCES VI CONTENTS 3.4
CONTAMINATION SOURCES 45 3.4.1 OIL BACKSTREAMING 46 3.4.2 GAS EVOLUTION
50 3.4.3 DUST 54 3.5 PRESSURE MEASUREMENT 55 3.6 CONCLUSION 60 3.7
EXERCISES 61 3.8 REFERENCES 62 3.9 RECOMMENDED READINGS 62 CHAPTER 4.
EVAPORATION 63 4.1 THERMODYNAMICS OF EVAPORATION 63 4.2 EVAPORATION RATE
71 4.3 ALLOYS 74 4.4 COMPOUNDS 77 4.5 SOURCES 81 4.5.1 BASIC DESIGNS 81
4.5.2 CONTAMINATION 84 4.5.3 TEMPERATURE CONTROL 85 4.5.4 ENERGY
ENHANCEMENT 90 4.6 TRANSPORT 94 4.7 VAPOR FLUX MONITORING 98 4.8
DEPOSITION MONITORING 100 4.8.1 MASS DEPOSITION 101 4.8.2 OPTICAL
TECHNIQUES 105 4.9 CONCLUSION 115 4.10 EXERCISES 115 4.11 REFERENCES 117
4.12 RECOMMENDED READINGS 118 CHAPTER 5. DEPOSITION 119 5.1 ADSORPTION
120 5.2 SURFACE DIFFUSION 129 5.3 NUCLEATION 139 5.3.1 SURFACE ENERGY
139 5.3.2 THREE-DIMENSIONAL NUCLEATION 145 5.3.3 TWO-DIMENSIONAL
NUCLEATION 154 5.3.4 TEXTURING 156 5.4 STRUCTURE DEVELOPMENT 159 5.4.1
QUENCHED GROWTH 161 5.4.2 THERMALLY ACTIVATED GROWTH 170 5.4.3 AMORPHOUS
FILMS 177 5.4.4 COMPOSITES 179 5.5 INTERFACES 180 5.6 STRESS 185 5.6.1
PHYSICS 186 5.6.2 PROBLEMS 193 5.6.3 INTRINSIC STRESS 196 5.7 ADHESION
197 CONTENTS VII 6.1 6.2 6.3 6.4 6.5 SYMMETRY APPLICATIONS 6.2.1
SEMICONDUCTOR DEVICES DISRUPTION GROWTH MONITORING 6.4.1 ELECTRON
SPECTROSCOPY 6.4.2 DIFFRACTION COMPOSITION CONTROL 6.5.1 PRECIPITATES
6.5.2 ALLOYS 6.5.3 POINT DEFECTS AND SURFACE STRUCTURE 6.5.4 GASEOUS
SOURCES 6.5.5 FLUX MODULATION 6.5.6 DOPING 5.8 TEMPERATURE CONTROL 200
5.8.1 RADIATION 202 5.8.2 GAS CONDUCTION 208 5.8.3 MEASUREMENT 211 5.9
CONCLUSION 215 5.10 EXERCISES 215 5.11 REFERENCES 217 5.12 RECOMMENDED
READINGS 219 CHAPTER 6. EPITAXY 221 221 226 230 237 241 242 246 259 260
262 263 266 268 273 6.6 LATTICE MISMATCH 279 6.7 SURFACE MORPHOLOGY 293
6.7.1 TWO-DIMENSIONAL NUCLEATION 293 6.7.2 THREE-DIMENSIONAL
REARRANGEMENT 296 6.7.3 STATISTICAL ROUGHENING 299 6.8 CONCLUSION 300
6.9 EXERCISES 301 6.10 REFERENCES 302 6.11 RECOMMENDED READINGS 306
CHAPTER 7. CHEMICAL VAPOR DEPOSITION 307 7.1 GAS SUPPLY 309 7.1.1 SAFETY
311 7.1.2 FLOW CONTROL 312 7.1.3 CONTAMINATION 315 7.2 CONVECTION 317
7.2.1 LAMINAR FLOW IN DUCTS 318 7.2.2 AXISYMMETRIC FLOW 322 7.2.3 FREE
CONVECTION 327 7.3 REACTION *** 7.3.1 CHEMICAL EQUILIBRIUM 330 7.3.2
GAS-PHASE RATE 336 7.3.3 SURFACE PROCESSES 344 7.4 DIFFUSION 353 7.4.1
DIFFUSION-LIMITED DEPOSITION 355 VIII CONTENTS 7.4.2 REACTOR MODELS 358
7.4.3 TEMPERATURE GRADIENTS 363 7.5 CONCLUSION 365 7.6 EXERCISES 365 7.7
REFERENCES 367 7.8 RECOMMENDED READINGS 369 CHAPTER 8. ENERGY BEAMS 371
8.1 ELECTRON GENERATION 374 8.2 ELECTRON BEAMS 382 8.3 ARC PLASMAS 387
8.4 PULSED LASERS 394 8.5 ION BOMBARDMENT 400 8.5.1 SURFACE EFFECTS 402
8.5.2 SUBSURFACE EFFECTS 411 8.5.3 BULK-FILM MODIFICATION 423 8.5.4
SPUTTERING 431 8.6 CONCLUSION 446 8.7 EXERCISES 447 8.8 REFERENCES 449
8.9 RECOMMENDED READINGS 452 CHAPTER 9. GLOW-DISCHARGE PLASMAS 453 9.1
ELECTRON-IMPACT REACTIONS 454 9.2 PLASMA STRUCTURE 462 9.3 DC EXCITATION
470 9.3.1 PARALLEL-PLATE CONFIGURATION 470 9.3.2 CHEMICAL-ACTIVATION
APPLICATIONS 473 9.3.3 SPUTTERING 476 9.3.4 MAGNETRONS 482 9.4 FREQUENCY
EFFECTS 489 9.4.1 LOW-FREQUENCY REGIME 491 9.4.2 TRANSITION TO HIGH
FREQUENCY 494 9.4.3 RF BIAS 499 9.4.4 POWER COUPLING 503 9.5
ELECTRODELESS EXCITATION 507 9.5.1 MICROWAVES 508 9.5.2 HELICONS 518
9.5.3 INDUCTIVE COILS 521 9.6 PLASMA CHEMISTRY 524 9.6.1 KINETICS 526
9.6.2 MACROPARTICLES 533 9.6.3 DOWNSTREAM DEPOSITION 536 9.6.4 CASE
STUDIES 541 9.7 CONCLUSION 549 9.8 EXERCISES 550 9.9 REFERENCES 551 9.10
SUGGESTED READINGS 555 CONTENTS IX CHAPTER 10. FILM ANALYSIS 557 558 558
560 563 564 566 568 570 571 572 572 573 574 575 575 581 583 10.5
REFERENCES 583 10.6 RECOMMENDED READING 584 APPENDIX A UNITS 585
APPENDIX * VAPOR PRESSURES OF THE ELEMENTS 587 APPENDIX * SPUTTERING
YIELDS OF THE ELEMENTS 591 APPENDIX D CHARACTERISTICS OF TUNGSTEN
FILAMENTS 593 APPENDIX E SONIC ORIFICE FLOW 597 INDEX 599 10.1 10.2 10.3
10.4 STRUCTURE 10.1.1 THICKNESS 10.1.2 SURFACE TOPOGRAPHY 10.1.3 BULK
INHOMOGENEITY 10.1.4 CRYSTALLOGRAPHY 10.1.5 BONDING 10.1.6 POINT DEFECTS
COMPOSITION 10.2.1 ELECTRONS AND X-RAYS 10.2.2 MASS SPECTROMETRY 10.2.3
RUTHERFORD BACKSCATTERING 10.2.4 HYDROGEN PROPERTIES 10.3.1 OPTICAL
BEHAVIOR 10.3.2 ELECTRICAL BEHAVIOR 10.3.3 MECHANICAL BEHAVIOR
CONCLUSION
|
| any_adam_object | 1 |
| author | Smith, Donald L. 1953- |
| author_GND | (DE-588)120228041 |
| author_facet | Smith, Donald L. 1953- |
| author_role | aut |
| author_sort | Smith, Donald L. 1953- |
| author_variant | d l s dl dls |
| building | Verbundindex |
| bvnumber | BV010217474 |
| classification_rvk | UP 7550 |
| classification_tum | ELT 279f |
| ctrlnum | (OCoLC)318378737 (DE-599)BVBBV010217474 |
| dewey-full | 621.38152 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.38152 |
| dewey-search | 621.38152 |
| dewey-sort | 3621.38152 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| edition | Internat. ed. |
| format | Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02472nam a2200625 c 4500</leader><controlfield tag="001">BV010217474</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20161024 </controlfield><controlfield tag="007">t|</controlfield><controlfield tag="008">950612s1995 xx ad|| |||| 00||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0070585024</subfield><subfield code="9">0-07-058502-4</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">9780070585027</subfield><subfield code="9">978-0-07-058502-7</subfield></datafield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0071139133</subfield><subfield code="9">0-07-113913-3</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)318378737</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV010217474</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-898</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-91</subfield><subfield code="a">DE-29T</subfield><subfield code="a">DE-703</subfield><subfield code="a">DE-19</subfield><subfield code="a">DE-634</subfield><subfield code="a">DE-20</subfield><subfield code="a">DE-83</subfield><subfield code="a">DE-706</subfield><subfield code="a">DE-11</subfield><subfield code="a">DE-384</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.38152</subfield><subfield code="b">S537</subfield><subfield code="2">20</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 7550</subfield><subfield code="0">(DE-625)146434:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">ELT 279f</subfield><subfield code="2">stub</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">Smith, Donald L.</subfield><subfield code="d">1953-</subfield><subfield code="e">Verfasser</subfield><subfield code="0">(DE-588)120228041</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Thin film deposition</subfield><subfield code="b">principles and practice</subfield><subfield code="c">Donald L. Smith</subfield></datafield><datafield tag="246" ind1="1" ind2="3"><subfield code="a">Thin-film deposition</subfield></datafield><datafield tag="250" ind1=" " ind2=" "><subfield code="a">Internat. ed.</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York u.a.</subfield><subfield code="b">McGraw-Hill</subfield><subfield code="c">1995</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XXIII, 616 S.</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Hier auch spätere, unveränderte Nachdrucke</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Dispositivos de películas delgadas</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Galvanoplastia al vapor</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Películas delgadas</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Gasphasenepitaxie</subfield><subfield code="0">(DE-588)4156040-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Bauelement</subfield><subfield code="0">(DE-588)4004741-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Gasphasenepitaxie</subfield><subfield code="0">(DE-588)4156040-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2="1"><subfield code="a">Bauelement</subfield><subfield code="0">(DE-588)4004741-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Dünnschichttechnik</subfield><subfield code="0">(DE-588)4136339-5</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2="1"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="4" ind2="0"><subfield code="a">CVD-Verfahren</subfield><subfield code="0">(DE-588)4009846-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="4" ind2="1"><subfield code="a">Dünne Schicht</subfield><subfield code="0">(DE-588)4136925-7</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="4" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="856" ind1="4" ind2="2"><subfield code="m">GBV Datenaustausch</subfield><subfield code="q">application/pdf</subfield><subfield code="u">http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006790180&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA</subfield><subfield code="3">Inhaltsverzeichnis</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-006790180</subfield></datafield></record></collection> |
| id | DE-604.BV010217474 |
| illustrated | Illustrated |
| indexdate | 2024-12-20T09:50:08Z |
| institution | BVB |
| isbn | 0070585024 9780070585027 0071139133 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-006790180 |
| oclc_num | 318378737 |
| open_access_boolean | |
| owner | DE-898 DE-BY-UBR DE-355 DE-BY-UBR DE-91 DE-BY-TUM DE-29T DE-703 DE-19 DE-BY-UBM DE-634 DE-20 DE-83 DE-706 DE-11 DE-384 |
| owner_facet | DE-898 DE-BY-UBR DE-355 DE-BY-UBR DE-91 DE-BY-TUM DE-29T DE-703 DE-19 DE-BY-UBM DE-634 DE-20 DE-83 DE-706 DE-11 DE-384 |
| physical | XXIII, 616 S. Ill., graph. Darst. |
| publishDate | 1995 |
| publishDateSearch | 1995 |
| publishDateSort | 1995 |
| publisher | McGraw-Hill |
| record_format | marc |
| spellingShingle | Smith, Donald L. 1953- Thin film deposition principles and practice Dispositivos de películas delgadas Galvanoplastia al vapor Películas delgadas Dünnschichttechnik (DE-588)4136339-5 gnd Dünne Schicht (DE-588)4136925-7 gnd Gasphasenepitaxie (DE-588)4156040-1 gnd Bauelement (DE-588)4004741-6 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
| subject_GND | (DE-588)4136339-5 (DE-588)4136925-7 (DE-588)4156040-1 (DE-588)4004741-6 (DE-588)4009846-1 |
| title | Thin film deposition principles and practice |
| title_alt | Thin-film deposition |
| title_auth | Thin film deposition principles and practice |
| title_exact_search | Thin film deposition principles and practice |
| title_full | Thin film deposition principles and practice Donald L. Smith |
| title_fullStr | Thin film deposition principles and practice Donald L. Smith |
| title_full_unstemmed | Thin film deposition principles and practice Donald L. Smith |
| title_short | Thin film deposition |
| title_sort | thin film deposition principles and practice |
| title_sub | principles and practice |
| topic | Dispositivos de películas delgadas Galvanoplastia al vapor Películas delgadas Dünnschichttechnik (DE-588)4136339-5 gnd Dünne Schicht (DE-588)4136925-7 gnd Gasphasenepitaxie (DE-588)4156040-1 gnd Bauelement (DE-588)4004741-6 gnd CVD-Verfahren (DE-588)4009846-1 gnd |
| topic_facet | Dispositivos de películas delgadas Galvanoplastia al vapor Películas delgadas Dünnschichttechnik Dünne Schicht Gasphasenepitaxie Bauelement CVD-Verfahren |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=006790180&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| work_keys_str_mv | AT smithdonaldl thinfilmdepositionprinciplesandpractice AT smithdonaldl thinfilmdeposition |
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| Signatur: |
0202 ELT 279 95 A 1390 Lageplan |
|---|---|
| Exemplar 1 | Ausleihbar Am Standort |