Availability: Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers

Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers:

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Bibliographic Details
Main Authors:	Hochreiter, André (Author), Groß, Fabian (Author), Möller, Morris-Niklas (Author), Krieger, Michael (Author), Weber, Heiko B. (Author)
Format:	Electronic eBook
Language:	English
Published:	Erlangen ; Nürnberg Friedrich-Alexander-Universität Erlangen-Nürnberg 2023
Subjects:	Engineering. Science. Life sciences. Psychology. Computer science. Technology and Engineering. Physical Sciences. Life Sciences. Behavioral Sciences and Psychology. Computer Science.
Links:	https://open.fau.de/handle/openfau/31525 https://d-nb.info/1316820106/34
Physical Description:	1 Online-Ressource

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spelling	Hochreiter, André Verfasser aut Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers André Hochreiter, Fabian Groß, Morris-Niklas Möller, Michael Krieger, Heiko B. Weber Erlangen ; Nürnberg Friedrich-Alexander-Universität Erlangen-Nürnberg 2023 1 Online-Ressource txt rdacontent c rdamedia cr rdacarrier Archivierung/Langzeitarchivierung gewährleistet DE-101 pdager Engineering. Science. Life sciences. Psychology. Computer science. Technology and Engineering. Physical Sciences. Life Sciences. Behavioral Sciences and Psychology. Computer Science. Groß, Fabian Verfasser aut Möller, Morris-Niklas Verfasser aut Krieger, Michael Verfasser aut Weber, Heiko B. Verfasser aut Sonderdruck aus Scientific Reports Vol. 13 (2023) 10.1038/s41598-023-46110-2 https://open.fau.de/handle/openfau/31525 Verlag kostenfrei Volltext https://d-nb.info/1316820106/34 Langzeitarchivierung Nationalbibliothek kostenfrei Volltext 1\p emakn 0,35575 20240123 DE-101 https://d-nb.info/provenance/plan#emakn 2\p emasg 0,48533 20240123 DE-101 https://d-nb.info/provenance/plan#emasg 3\p npi 20240122 DE-101 https://d-nb.info/provenance/plan#npi
spellingShingle	Hochreiter, André Groß, Fabian Möller, Morris-Niklas Krieger, Michael Weber, Heiko B. Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers Engineering. Science. Life sciences. Psychology. Computer science.
title	Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers
title_auth	Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers
title_exact_search	Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers
title_full	Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers André Hochreiter, Fabian Groß, Morris-Niklas Möller, Michael Krieger, Heiko B. Weber
title_fullStr	Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers André Hochreiter, Fabian Groß, Morris-Niklas Möller, Michael Krieger, Heiko B. Weber
title_full_unstemmed	Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers André Hochreiter, Fabian Groß, Morris-Niklas Möller, Michael Krieger, Heiko B. Weber
title_short	Electrochemical etching strategy for shaping monolithic 3D structures from 4H-SiC wafers
title_sort	electrochemical etching strategy for shaping monolithic 3d structures from 4h sic wafers
topic	Engineering. Science. Life sciences. Psychology. Computer science.
topic_facet	Engineering. Science. Life sciences. Psychology. Computer science.
url	https://open.fau.de/handle/openfau/31525 https://d-nb.info/1316820106/34
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