Gespeichert in:
| Beteilige Person: | |
|---|---|
| Format: | Elektronisch E-Book |
| Sprache: | Englisch |
| Veröffentlicht: |
Hauppauge, N.Y.,USA
Nova Science Publishers
c2009
|
| Schlagwörter: | |
| Links: | http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=410208 http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=410208 http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=410208 |
| Beschreibung: | Includes index Includes bibliographical references (p. 129-137) and indexes |
| Umfang: | 1 Online-Ressource (xvi, 140 p.) |
| ISBN: | 1606923250 1614703140 9781606923252 9781614703143 |
Internformat
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Datensatz im Suchindex
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| id | DE-604.BV043166357 |
| illustrated | Not Illustrated |
| indexdate | 2024-12-20T17:30:13Z |
| institution | BVB |
| isbn | 1606923250 1614703140 9781606923252 9781614703143 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-028590548 |
| oclc_num | 777548953 |
| open_access_boolean | |
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| owner_facet | DE-1046 DE-1047 |
| physical | 1 Online-Ressource (xvi, 140 p.) |
| psigel | ZDB-4-EBA ZDB-4-EBA FAW_PDA_EBA |
| publishDate | 2009 |
| publishDateSearch | 2009 |
| publishDateSort | 2009 |
| publisher | Nova Science Publishers |
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| spelling | Geiser, Juergen Verfasser aut Models and simulation of deposition processes with CVD apparatus theory and applications Juergen Ernst Geiser Hauppauge, N.Y.,USA Nova Science Publishers c2009 1 Online-Ressource (xvi, 140 p.) txt rdacontent c rdamedia cr rdacarrier Includes index Includes bibliographical references (p. 129-137) and indexes TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh Mathematisches Modell Chemical vapor deposition Mathematical models Chemical vapor deposition Computer simulation http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=410208 Aggregator Volltext |
| spellingShingle | Geiser, Juergen Models and simulation of deposition processes with CVD apparatus theory and applications TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh Mathematisches Modell Chemical vapor deposition Mathematical models Chemical vapor deposition Computer simulation |
| title | Models and simulation of deposition processes with CVD apparatus theory and applications |
| title_auth | Models and simulation of deposition processes with CVD apparatus theory and applications |
| title_exact_search | Models and simulation of deposition processes with CVD apparatus theory and applications |
| title_full | Models and simulation of deposition processes with CVD apparatus theory and applications Juergen Ernst Geiser |
| title_fullStr | Models and simulation of deposition processes with CVD apparatus theory and applications Juergen Ernst Geiser |
| title_full_unstemmed | Models and simulation of deposition processes with CVD apparatus theory and applications Juergen Ernst Geiser |
| title_short | Models and simulation of deposition processes with CVD apparatus |
| title_sort | models and simulation of deposition processes with cvd apparatus theory and applications |
| title_sub | theory and applications |
| topic | TECHNOLOGY & ENGINEERING / Electronics / Semiconductors bisacsh TECHNOLOGY & ENGINEERING / Electronics / Solid State bisacsh Mathematisches Modell Chemical vapor deposition Mathematical models Chemical vapor deposition Computer simulation |
| topic_facet | TECHNOLOGY & ENGINEERING / Electronics / Semiconductors TECHNOLOGY & ENGINEERING / Electronics / Solid State Mathematisches Modell Chemical vapor deposition Mathematical models Chemical vapor deposition Computer simulation |
| url | http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=410208 |
| work_keys_str_mv | AT geiserjuergen modelsandsimulationofdepositionprocesseswithcvdapparatustheoryandapplications |