Materials processing by cluster ion beams: history, technology, and applications
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| Main Author: | |
|---|---|
| Format: | Book |
| Language: | English |
| Published: |
Boca Raton
CRC Press
[2016]
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| Links: | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028311259&sequence=000003&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=028311259&sequence=000004&line_number=0002&func_code=DB_RECORDS&service_type=MEDIA |
| Physical Description: | XV, 244 Seiten Illustrationen |
| ISBN: | 9781498711753 |
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Record in the Search Index
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| adam_text | MATERIALS SCIENCE
Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing.
Written by the originator of the gas cluster ion beam (GCIB) concept, this book:
• Offers an overview of ion beam technologies, from the discovery of monomer ions to the introduction of GCIBs
• Explores the development of sources for producing cluster beams from solid materials
• Describes the engineering characteristics of gas cluster ion beam equipment
• Covers cluster ion-solid surface interaction kinetics as well as sputtering, implantation, and ion-assisted deposition
• Details surface processing techniques for smoothing, shallow implantation, and preparation of high-quality thin films
• Introduces representative examples of emerging GCIB industrial applications
Materials Processing by Cluster Ion Beams: History, Technology, and Applications provides a deeper understanding of the importance of cluster ion beams and their applications.
Contents
R
Acknowledgments................................. ix
Preface....................................... xi
Author.......................................... xv
Chapter 1: Ion Beam Technology: Overview and
History.......................................... 1
1.1 Overview
1.2 History References
Chapter 2: History and Milestones of Cluster
Beam Development...............................................21
2.1 Cluster Beam Discovery and Early Fundamental Progress
2.2 Development of Gas Cluster Beam Equipment
2.2.1 Precursor Technology
2.2.2 Origination of Gas Cluster Ion Beam Technology
2.3 Development of Gas Cluster Ion Beam Processing
2.4 Development of Polyatomic Ion Beam Processing References
Chapter 3: Development of Cluster Beam Sources for Solid Materials..........................................59
3.1 Gas Condensation and Aggregation Sources
3.2 Pure Expansion Source
3.3 Arc Vaporization Sources
3.4 Laser Irradiation Sources
3.5 Ion and Plasma Sputtering Sources
3.6 Polyatomic Sources References
Chapter 4: Gas Cluster Ion Beam Equipment....................85
4.1 Gas Cluster Ion Beam Equipment for Process Applications
4.2 Generation of Gas Cluster Beams
4.3 Ionization of Gas Cluster Beams
4.3.1 Electron Energy Dependence
4.3.2 Cluster Size Dependence
4.3.3 Ionization Efficiency Dependence
4.4 Cluster Size Distributions
4.5 Beam Transport Characteristics of Cluster Ion Beams References
VII
Contents
VIII
Chapter 5: Cluster Ion-Solid Surface Interaction
Kinetics................................................115
5.1 Gas Cluster Ion Beams
5.2 Polyatomic Ion Beams References
Chapter 6: Cluster Ion Beam Sputtering..................131
6.1 Lateral Sputtering
6.2 Physical Sputtering
6.3 Reactive Sputtering
6.4 Surface Smoothing References
Chapter 7: Cluster Ion Implantation...........................157
7.1 Gas Cluster Ion Implantation: Infusion Doping Process
7.2 Polyatomic Cluster Ion Implantation References
Chapter 8: Cluster Ion Beam-Assisted Deposition.... 175
8.1 Oxide Films
8.2 Diamondlike Carbon Films References
Chapter 9: Applications.......................................195
9.1 Nanoscale Etching and Smoothing for Optical and Magnetic Devices
9.2 Highly Anisotropic Etching Processing
9.3 Semiconductor Device Fabrication
9.3.1 GCIB Infusion Doping
9.3.2 Polyatomic Cluster Ion Doping
9.4 Analytical Instrumentation Applications
9.5 Biomaterial Applications
9.5.1 GCIB Processing for Biomaterial Applications
9.5.2 ANAB Processing for Biomaterial Applications
References
Chapter 10: Conclusions.............................235
Index...............................................239
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| indexdate | 2024-12-20T17:22:19Z |
| institution | BVB |
| isbn | 9781498711753 |
| language | English |
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| publishDate | 2016 |
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| spellingShingle | Yamada, Isao Materials processing by cluster ion beams history, technology, and applications |
| title | Materials processing by cluster ion beams history, technology, and applications |
| title_auth | Materials processing by cluster ion beams history, technology, and applications |
| title_exact_search | Materials processing by cluster ion beams history, technology, and applications |
| title_full | Materials processing by cluster ion beams history, technology, and applications Isao Yamada |
| title_fullStr | Materials processing by cluster ion beams history, technology, and applications Isao Yamada |
| title_full_unstemmed | Materials processing by cluster ion beams history, technology, and applications Isao Yamada |
| title_short | Materials processing by cluster ion beams |
| title_sort | materials processing by cluster ion beams history technology and applications |
| title_sub | history, technology, and applications |
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