High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition:
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| Main Author: | |
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| Format: | Thesis/Dissertation Book |
| Language: | English |
| Published: |
Jülich
Forschungszentrum Jülich, Zentralbibliothek
2013
|
| Series: | Schriften des Forschungszentrums Jülich
Reihe Energie & Umwelt ; 183 |
| Subjects: | |
| Links: | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=026836645&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
| Physical Description: | X, 126 S. graph. Darst. |
| ISBN: | 9783893368921 |
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| 245 | 1 | 0 | |a High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition |c Thomas Zimmermann |
| 264 | 1 | |a Jülich |b Forschungszentrum Jülich, Zentralbibliothek |c 2013 | |
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Record in the Search Index
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| adam_text | CONTENTS
ABSTRACT III
1 INTRODUCTION 1
2 FUNDAMENTALS 5
2.1 THIN-FILM SILICON TANDEM SOLAR CELL 5
2.2 PREPARATION OF A-SI:H AND /:/C-SI:H 7
2.2.1 PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION 7
2.2.2 PROCESS PARAMETERS 8
2.2.3 LARGE-AREA DEPOSITION SYSTEM (LADA) 9
2.3 GROWTH OF A-SI:H AND /TC-SI:H 11
2.3.1 SURFACE DIFFUSION MODEL 12
2.3.2 ETCHING MODEL 13
2.3.3 CHEMICAL ANNEALING MODEL 13
2.4 MATERIAL PROPERTIES 14
2.4.1 OPTICAL PROPERTIES 14
2.4.2 DANGLING BONDS AND HYDROGEN INCORPORATION 15
2.4.3 STAEBLER-WRONSKI EFFECT 15
2.5 CHARACTERIZATION METHODS 16
2.5.1 CONDUCTIVITY MEASUREMENT 16
2.5.2 PHOTOTHERMAL DEFLECTION SPECTROSCOPY 17
2.5.3 RAMAN SPECTROSCOPY 18
2.5.4 FOURIER TRANSFORM INFRARED SPECTROSCOPY 19
2.5.5 CURRENT-VOLTAGE MEASUREMENT 21
2.5.6 DIFFERENTIAL SPECTRAL RESPONSE 23
V
HTTP://D-NB.INFO/1043124721
CONTENTS
3 DEVELOPMENT OF A DYNAMIC DEPOSITION TECHNIQUE FOR THIN-FILM SILICON 25
3.1 LARGE AREA DEPOSITION USING VERY-HIGH FREQUENCIES 25
3.1.1 STATE-OF-THE-ART VHF-PECVD SYSTEMS 26
3.1.2 CONCEPT OF DYNAMIC DEPOSITION USING LINEAR PLASMA SOURCES .... 28
3.2 PREREQUISITES FOR A UNIFORM DYNAMIC DEPOSITION PROCESS 29
3.3 EXPERIMENTAL REALIZATION OF A DYNAMIC DEPOSITION PROCESS 30
3.3.1 DEVELOPMENT OF A STABLE CARRIER GROUNDING 30
3.3.2 DESIGN OF THE TRANSPORT SYSTEM 32
3.3.3 TEMPERATURE CONTROL DURING DYNAMIC DEPOSITION PROCESSES 33
3.3.4 LINEAR GAS DISTRIBUTION SYSTEM 35
3.4 PROCESS SEQUENCE FOR THIN-FILM SILICON SOLAR CELLS 36
3.5 CONCLUSIONS 38
4 DYNAMIC DEPOSITION OF
/IC
-SI:H SOLAR CELLS 39
4.1 BASELINE STATIC RADIO-FREQUENCY DEPOSITION PROCESS 39
4.1.1 INFLUENCE OF THE CRYSTALLINITY ON THE SOLAR CELL PERFORMANCE 40
4.1.2 CORRELATION BETWEEN GROWTH RATE AND CRYSTALLINITY 42
4.1.3 SUMMARY 43
4.2 IMPLICATIONS OF A LINEAR GAS DISTRIBUTION SYSTEM 44
4.2.1 HOMOGENEITY OF SOLAR CELL PERFORMANCE 44
4.2.2 LOCAL GROWTH RATE AND CRYSTALLINITY 46
4.2.3 SUMMARY 48
4.3 COMPARISON OF /TC-SI:H SOLAR CELLS DEPOSITED BY STATIC RF- AND VHF-
PECVD PROCESSES 48
4.3.1 INFLUENCE OF THE CRYSTALLINITY ON THE SOLAR CELL PERFORMANCE 48
4.3.2 CORRELATION BETWEEN GROWTH RATE AND CRYSTALLINITY 51
4.3.3 SUMMARY 52
4.4 REDUCED DEPOSITION TIMES FOR /IC-SI:H ABSORBER LAYERS 53
4.4.1 CORRELATION BETWEEN GROWTH RATE AND SOLAR CELL EFFICIENCY 54
4.4.2 INFLUENCE OF I-LAYER THICKNESS ON SOLAR CELL EFFICIENCY 55
4.4.3 SUMMARY 56
4.5 DYNAMIC DEPOSITION OF
^IC
-SI:H ABSORBER LAYERS 57
4.5.1 INFLUENCE OF THE DYNAMIC DEPOSITION PROCESS ON THE SOLAR CELL PER
FORMANCE -57
VI
CONTENTS
4.5.2 SOURCES OF REDUCED LAYER QUALITY IN DYNAMIC DEPOSITION PROCESSES .
60
4.5.3 INFLUENCE OF THE DYNAMIC DEPOSITION PROCESSES ON THE TRANSITION
FROM MICROCRYSTALLINE TO AMORPHOUS LAYER GROWTH 62
4.5.4 HOMOGENEITY OF DYNAMIC DEPOSITION PROCESS 63
4.5.5 SUMMARY 64
4.6 EFFECTS OF CHANGING SILANE CONCENTRATIONS DURING I-LAYER GROWTH ON
/JC-SI:H
SOLAR CELLS 64
4.6.1 VARIATION IN GROWTH CONDITIONS DUE TO DYNAMIC DEPOSITION PROCESSES
65
4.6.2 INFLUENCE OF THE GAS UTILIZATION ON ^,C-SI:H SOLAR CELLS 67
4.6.3 INFLUENCE OF THE THICKNESS PER PERIOD ON /IC-SI:H SOLAR CELLS ....
69
4.6.4 SUMMARY 71
4.7 CONCLUSIONS 71
5 DYNAMIC DEPOSITION OF A-SI:H SOLAR CELLS 73
5.1 INFLUENCE OF THE DEPOSITION RATE ON THE I-LAYER PROPERTIES 73
5.1.1 HYDROGEN INCORPORATION 74
*5.1.2 ELECTRICAL PROPERTIES 76
5.1.3 OPTICAL PROPERTIES 77
5.1.4 SUMMARY 79
5.2 INFLUENCE OF THE DEPOSITION RATE ON THE SOLAR CELL PERFORMANCE 79
5.2.1 INITIAL AND STABILIZED SOLAR CELL PERFORMANCE AS A FUNCTION OF THE
DEPOSITION RATE SO
5.2.2 INFLUENCE OF THE PROCESS PARAMETERS ON THE STABILIZED OPEN-CIRCUIT
VOLTAGE AND SHORT-CIRCUIT CURRENT DENSITY 82
5.2.3 ORIGIN OF REDUCED SHORT-CIRCUIT CURRENT DENSITY AT HIGH GROWTH
RATES 84
5.2.4 SUMMARY 85
5.3 INFLUENCE OF THE PROCESS PARAMETER ON THE DEGRADATION LOSS 86
5.4 INTERDEPENDENCY OF PROCESS PARAMETERS S8
5.5 REDUCED DEPOSITION TIMES FOR THIN-FILM SILICON TANDEM SOLAR CELLS 90
*5.5.1 SIMPLIFIED TANDEM SOLAR CELL MODEL 91
5.5.2 CORRELATION BETWEEN GROWTH RATE AND SOLAR CELL PERFORMANCE .... 92
5.5.3 DISCUSSION OF THE MODEL VALIDITY 94
5.5.4 SUMMARY 95
5.6 CONCLUSIONS 95
VII
CONTENTS
6 SUMMARY AND OUTLOOK 97
APPENDIX A MATERIAL PROPERTIES OF DOPED LAYERS 103
APPENDIX B DEPOSITION REGIMES FOR INTRINSIC ^C-SI:H 104
APPENDIX C DEPOSITION REGIMES FOR INTRINSIC A-SI:H 106
BIBLIOGRAPHY 107
ACKNOWLEDGEMENTS 121
LIST OF PUBLICATIONS 123
CURRICULUM VITAE 126
VIII
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| any_adam_object | 1 |
| author | Zimmermann, Thomas 1982- |
| author_GND | (DE-588)1043538070 |
| author_facet | Zimmermann, Thomas 1982- |
| author_role | aut |
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| dewey-full | 621.31244 500 |
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| dewey-search | 621.31244 500 |
| dewey-sort | 3621.31244 |
| dewey-tens | 620 - Engineering and allied operations 500 - Natural sciences and mathematics |
| discipline | Allgemeine Naturwissenschaft Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Thesis Book |
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| genre_facet | Hochschulschrift |
| id | DE-604.BV041388817 |
| illustrated | Illustrated |
| indexdate | 2024-12-20T16:46:19Z |
| institution | BVB |
| isbn | 9783893368921 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-026836645 |
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| owner_facet | DE-12 DE-29T |
| physical | X, 126 S. graph. Darst. |
| publishDate | 2013 |
| publishDateSearch | 2013 |
| publishDateSort | 2013 |
| publisher | Forschungszentrum Jülich, Zentralbibliothek |
| record_format | marc |
| series | Schriften des Forschungszentrums Jülich |
| series2 | Schriften des Forschungszentrums Jülich : Reihe Energie & Umwelt |
| spellingShingle | Zimmermann, Thomas 1982- High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition Schriften des Forschungszentrums Jülich |
| subject_GND | (DE-588)4113937-9 |
| title | High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition |
| title_auth | High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition |
| title_exact_search | High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition |
| title_full | High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition Thomas Zimmermann |
| title_fullStr | High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition Thomas Zimmermann |
| title_full_unstemmed | High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition Thomas Zimmermann |
| title_short | High-rate growth of hydrogenated amorphous and microcrystalline silicon for thin-film silicon solar cells using dynamic very-high frequency plasma-enhanced chemical vapor deposition |
| title_sort | high rate growth of hydrogenated amorphous and microcrystalline silicon for thin film silicon solar cells using dynamic very high frequency plasma enhanced chemical vapor deposition |
| topic_facet | Hochschulschrift |
| url | http://bvbr.bib-bvb.de:8991/F?func=service&doc_library=BVB01&local_base=BVB01&doc_number=026836645&sequence=000001&line_number=0001&func_code=DB_RECORDS&service_type=MEDIA |
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| work_keys_str_mv | AT zimmermannthomas highrategrowthofhydrogenatedamorphousandmicrocrystallinesiliconforthinfilmsiliconsolarcellsusingdynamicveryhighfrequencyplasmaenhancedchemicalvapordeposition |