Verfügbarkeit: Photoresist | Technische Universität München

Photoresist: Materials and processes

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Bibliographische Detailangaben
Beteilige Person:	De Forest, William S. (VerfasserIn)
Format:	Buch
Sprache:	Englisch
Veröffentlicht:	New York McGraw-Hill 1975
Schlagwörter:	Integrated circuits Photoresists Printed circuits Photowiderstand Organische Verbindungen Elektronik Makromolekül Photoresist Polymere
Umfang:	XI, 269 S. Ill. u. graph. Darst.

Internformat

MARC


LEADER	00000nam a2200000 c 4500
001	BV001967790
003	DE-604
005	00000000000000.0
007	t\|
008	890928s1975 xx ad\|\| \|\|\|\| 00\|\|\| eng d
035			\|a (OCoLC)1054407
035			\|a (DE-599)BVBBV001967790
040			\|a DE-604 \|b ger \|e rakddb
041	0		\|a eng
049			\|a DE-91 \|a DE-355 \|a DE-29T
050		0	\|a TK7874
082	0		\|a 621.381/73
084			\|a UP 5300 \|0 (DE-625)146416: \|2 rvk
100	1		\|a De Forest, William S. \|e Verfasser \|4 aut
245	1	0	\|a Photoresist \|b Materials and processes
264		1	\|a New York \|b McGraw-Hill \|c 1975
300			\|a XI, 269 S. \|b Ill. u. graph. Darst.
336			\|b txt \|2 rdacontent
337			\|b n \|2 rdamedia
338			\|b nc \|2 rdacarrier
650		4	\|a Integrated circuits
650		4	\|a Photoresists
650		4	\|a Printed circuits
650	0	7	\|a Photowiderstand \|0 (DE-588)4136944-0 \|2 gnd \|9 rswk-swf
650	0	7	\|a Organische Verbindungen \|0 (DE-588)4043816-8 \|2 gnd \|9 rswk-swf
650	0	7	\|a Elektronik \|0 (DE-588)4014346-6 \|2 gnd \|9 rswk-swf
650	0	7	\|a Makromolekül \|0 (DE-588)4037172-4 \|2 gnd \|9 rswk-swf
650	0	7	\|a Photoresist \|0 (DE-588)4174545-0 \|2 gnd \|9 rswk-swf
650	0	7	\|a Polymere \|0 (DE-588)4046699-1 \|2 gnd \|9 rswk-swf
689	0	0	\|a Photowiderstand \|0 (DE-588)4136944-0 \|D s
689	0		\|5 DE-604
689	1	0	\|a Photoresist \|0 (DE-588)4174545-0 \|D s
689	1		\|5 DE-604
689	2	0	\|a Makromolekül \|0 (DE-588)4037172-4 \|D s
689	2		\|8 1\p \|5 DE-604
689	3	0	\|a Organische Verbindungen \|0 (DE-588)4043816-8 \|D s
689	3		\|8 2\p \|5 DE-604
689	4	0	\|a Polymere \|0 (DE-588)4046699-1 \|D s
689	4		\|8 3\p \|5 DE-604
689	5	0	\|a Elektronik \|0 (DE-588)4014346-6 \|D s
689	5		\|8 4\p \|5 DE-604
883	1		\|8 1\p \|a cgwrk \|d 20201028 \|q DE-101 \|u https://d-nb.info/provenance/plan#cgwrk
883	1		\|8 2\p \|a cgwrk \|d 20201028 \|q DE-101 \|u https://d-nb.info/provenance/plan#cgwrk
883	1		\|8 3\p \|a cgwrk \|d 20201028 \|q DE-101 \|u https://d-nb.info/provenance/plan#cgwrk
883	1		\|8 4\p \|a cgwrk \|d 20201028 \|q DE-101 \|u https://d-nb.info/provenance/plan#cgwrk
943	1		\|a oai:aleph.bib-bvb.de:BVB01-001283330

Datensatz im Suchindex

DE-BY-TUM_call_number	0001 76 A 2691
DE-BY-TUM_katkey	168542
DE-BY-TUM_location	Mag
DE-BY-TUM_media_number	040001308238
_version_	1821939807956238338
any_adam_object
author	De Forest, William S.
author_facet	De Forest, William S.
author_role	aut
author_sort	De Forest, William S.
author_variant	f w s d fws fwsd
building	Verbundindex
bvnumber	BV001967790
callnumber-first	T - Technology
callnumber-label	TK7874
callnumber-raw	TK7874
callnumber-search	TK7874
callnumber-sort	TK 47874
callnumber-subject	TK - Electrical and Nuclear Engineering
classification_rvk	UP 5300
ctrlnum	(OCoLC)1054407 (DE-599)BVBBV001967790
dewey-full	621.381/73
dewey-hundreds	600 - Technology (Applied sciences)
dewey-ones	621 - Applied physics
dewey-raw	621.381/73
dewey-search	621.381/73
dewey-sort	3621.381 273
dewey-tens	620 - Engineering and allied operations
discipline	Physik Elektrotechnik / Elektronik / Nachrichtentechnik
format	Book
fullrecord	<?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>02071nam a2200577 c 4500</leader><controlfield tag="001">BV001967790</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">00000000000000.0</controlfield><controlfield tag="007">t\|</controlfield><controlfield tag="008">890928s1975 xx ad\|\| \|\|\|\| 00\|\|\| eng d</controlfield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)1054407</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV001967790</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakddb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-91</subfield><subfield code="a">DE-355</subfield><subfield code="a">DE-29T</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7874</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.381/73</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 5300</subfield><subfield code="0">(DE-625)146416:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="100" ind1="1" ind2=" "><subfield code="a">De Forest, William S.</subfield><subfield code="e">Verfasser</subfield><subfield code="4">aut</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Photoresist</subfield><subfield code="b">Materials and processes</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">New York</subfield><subfield code="b">McGraw-Hill</subfield><subfield code="c">1975</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">XI, 269 S.</subfield><subfield code="b">Ill. u. graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Integrated circuits</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Photoresists</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Printed circuits</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Photowiderstand</subfield><subfield code="0">(DE-588)4136944-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Organische Verbindungen</subfield><subfield code="0">(DE-588)4043816-8</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Elektronik</subfield><subfield code="0">(DE-588)4014346-6</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Makromolekül</subfield><subfield code="0">(DE-588)4037172-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Photoresist</subfield><subfield code="0">(DE-588)4174545-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Polymere</subfield><subfield code="0">(DE-588)4046699-1</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Photowiderstand</subfield><subfield code="0">(DE-588)4136944-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="1" ind2="0"><subfield code="a">Photoresist</subfield><subfield code="0">(DE-588)4174545-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="1" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="2" ind2="0"><subfield code="a">Makromolekül</subfield><subfield code="0">(DE-588)4037172-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="2" ind2=" "><subfield code="8">1\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="3" ind2="0"><subfield code="a">Organische Verbindungen</subfield><subfield code="0">(DE-588)4043816-8</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="3" ind2=" "><subfield code="8">2\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="4" ind2="0"><subfield code="a">Polymere</subfield><subfield code="0">(DE-588)4046699-1</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="4" ind2=" "><subfield code="8">3\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="689" ind1="5" ind2="0"><subfield code="a">Elektronik</subfield><subfield code="0">(DE-588)4014346-6</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="5" ind2=" "><subfield code="8">4\p</subfield><subfield code="5">DE-604</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">1\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">2\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">3\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="883" ind1="1" ind2=" "><subfield code="8">4\p</subfield><subfield code="a">cgwrk</subfield><subfield code="d">20201028</subfield><subfield code="q">DE-101</subfield><subfield code="u">https://d-nb.info/provenance/plan#cgwrk</subfield></datafield><datafield tag="943" ind1="1" ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-001283330</subfield></datafield></record></collection>
id	DE-604.BV001967790
illustrated	Illustrated
indexdate	2024-12-20T07:44:00Z
institution	BVB
language	English
oai_aleph_id	oai:aleph.bib-bvb.de:BVB01-001283330
oclc_num	1054407
open_access_boolean
owner	DE-91 DE-BY-TUM DE-355 DE-BY-UBR DE-29T
owner_facet	DE-91 DE-BY-TUM DE-355 DE-BY-UBR DE-29T
physical	XI, 269 S. Ill. u. graph. Darst.
publishDate	1975
publishDateSearch	1975
publishDateSort	1975
publisher	McGraw-Hill
record_format	marc
spellingShingle	De Forest, William S. Photoresist Materials and processes Integrated circuits Photoresists Printed circuits Photowiderstand (DE-588)4136944-0 gnd Organische Verbindungen (DE-588)4043816-8 gnd Elektronik (DE-588)4014346-6 gnd Makromolekül (DE-588)4037172-4 gnd Photoresist (DE-588)4174545-0 gnd Polymere (DE-588)4046699-1 gnd
subject_GND	(DE-588)4136944-0 (DE-588)4043816-8 (DE-588)4014346-6 (DE-588)4037172-4 (DE-588)4174545-0 (DE-588)4046699-1
title	Photoresist Materials and processes
title_auth	Photoresist Materials and processes
title_exact_search	Photoresist Materials and processes
title_full	Photoresist Materials and processes
title_fullStr	Photoresist Materials and processes
title_full_unstemmed	Photoresist Materials and processes
title_short	Photoresist
title_sort	photoresist materials and processes
title_sub	Materials and processes
topic	Integrated circuits Photoresists Printed circuits Photowiderstand (DE-588)4136944-0 gnd Organische Verbindungen (DE-588)4043816-8 gnd Elektronik (DE-588)4014346-6 gnd Makromolekül (DE-588)4037172-4 gnd Photoresist (DE-588)4174545-0 gnd Polymere (DE-588)4046699-1 gnd
topic_facet	Integrated circuits Photoresists Printed circuits Photowiderstand Organische Verbindungen Elektronik Makromolekül Photoresist Polymere
work_keys_str_mv	AT deforestwilliams photoresistmaterialsandprocesses

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